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Software ASIMON G2 V3.0. Software ASIMON V3.0 is used for configuration, set-up and diagnostics of the AS-i safety monitor. asimon v3 config software Software ASIMON G2 V3.0. Software ASIMON V3.0 is used for configuration, set-up and diagnostics of the AS-i safety monitor. Category:Safety engineering Category:Software-related controversies1. Field of the Invention The invention relates to an arrangement for scanning a mask pattern onto a substrate, in which arrangement there is provided a system for determining the position of the substrate in at least one coordinate system. 2. Description of the Related Art Such an arrangement can be used, for example, in semiconductor lithography, in particular in the processing of wafers. It is used to scan the mask pattern onto the substrate with the aid of the photoresist and/or an acid applied thereto. The scanning is in the plane of the substrate and the image of the mask pattern is formed in the plane of the substrate in the presence of an illumination beam or in the absence thereof. A scanning system of this kind can be a system in which the position of the mask and/or the substrate is determined by a known method, e.g., by means of linear or rotary encoders or by means of television cameras or the like. This enables the position of the mask and the substrate to be determined without having to refer to a reference pattern, as required when reference marks are used. In the case of scanning systems of the kind described in the opening paragraph, a linear position encoder is usually used for the coordinate determination, as is known per se. In the case of scanning systems in which the position of the mask is determined by means of linear encoders, a problem results in the case of simultaneous scanning, i.e. scanning of the mask pattern on the substrate, as a result of the movement of the mask and the substrate being relative to one another, e.g. by virtue of a stage moving the mask and the substrate relative to one another, since the relative position of the mask and the substrate is also changed, even if only by a small distance. This displacement between the mask and the substrate has an effect on the position determination performed with the aid of the linear position encoders, i.e. a linear position encoder detects a signal value which is dependent
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